Neutron-induced displacement damage effect and mechanism of AlGaN/GaN high electron mobility transistor
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چکیده
منابع مشابه
Surface morphology of Al0.3Ga0.7N/Al2O3-high electron mobility transistor structure.
We present surface properties of buffer films (AIN and GaN) and Al0.3Gao.zN/Al2O3-High Electron Mobility Transistor (HEMT) structures with/without AIN interlayer grown on High Temperature (HT)-AIN buffer/Al2O3 substrate and Al2O3 substrate. We have found that the GaN surface morphology is step-flow in character and the density of dislocations was about 10(8)-10(9) cm(-2). The AFM measurements a...
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AlGaAs/InGaAs/GaAs pHEMT (pseudomorphic high electron mobility transistors) materials and devices have been studied with 20MeV Li ions irradiation at two different fluences. The structural and electrical characteristics have been studied and compared before and after the irradiation. It has been found that with the irradiation FWHM of the material not changes as confirmed with x-ray rocking cur...
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ژورنال
عنوان ژورنال: Acta Physica Sinica
سال: 2020
ISSN: 1000-3290
DOI: 10.7498/aps.69.20200714